发明名称 SAMPLE HOLDING DEVICE AND CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a sample holding device in which a moving route of a wafer has been secured wide, without interfering with an electrode to alleviate turbulence of an electric field around the wafer, and provide a charged particle beam device. SOLUTION: This sample holding device has a plurality of electrodes and is provided with a moving mechanism for vertically moving a part of the plurality of the electrodes. Moreover, the moving mechanism lowers the part of the plurality of the electrodes so as to be separated from an introduction route of a sample. Furthermore, the sample holding device has a positioning member of the sample, and positioning of the sample is carried out, after the mounting of the sample. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007227192(A) 申请公布日期 2007.09.06
申请号 JP20060047672 申请日期 2006.02.24
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KATO SUSUMU
分类号 H01J37/28;H01J37/20 主分类号 H01J37/28
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