APPARATUS FOR CLEANING SEMICONDUCTOR WAFER

摘要

An apparatus for cleaning a wafer is provided to prevent contamination of wafer stacked in the periphery of a wafer cleaning apparatus after cleaning and drying processes and semiconductor production equipment in the periphery of the wafer cleaning apparatus by including a door that opens/shuts an outlet of a housing covering a dry chamber according to the progression state of the dry process in the dry chamber. A plurality of wafers are cleaned in at least one process chamber. The plurality of wafers are dried in a dry chamber(700). The dry chamber and the process chamber becomes independent of the outside by a housing including an inlet and an outlet through which the wafer is transferred or returned wherein the dry chamber and the process chamber are covered by the housing. At least one door(800) selectively opens/shuts the inlet and outlet according as the cleaning process starts or the dry process is completed in the process chamber or dry chamber to prevent a cleaning solution or cleaning gas used in the dry chamber or process chamber from being exhausted through the inlet and outlet of the housing. The door gets open when a spindle for rotating the wafer in the dry chamber completes the dry process of the wafer to move up and blocks the outlet when the spindle moves down to perform a subsequent dry process of the wafer.