| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition which excels in stability when allowed to stand after exposure, causes no pattern drooping during heat curing, has such properties as high resolution, high heat resistance and high transparency after heat curing, and is used for forming a planarizing film for a TFT substrate, an interlayer insulation film and a core or clad material of an optical waveguide. <P>SOLUTION: The photosensitive siloxane composition comprises (a) a polysiloxane, (b) a quinonediazide compound, (c) a solvent and (d) a thermal acid generator represented by general formula (1a) and/or formula (1b). <P>COPYRIGHT: (C)2007,JPO&INPIT |
