| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle that prevents clouding in a photomask caused by a pellicle and decreases the number of mask cleaning times. <P>SOLUTION: The present invention is characterized in controlling a clouding source substance included in the pellicle to a predetermined value or less, and thereby, even when the clouding source substance becomes a foreign matter on the photomask, the generation of a defect in a product can be prevented. Therefore, an increase in the cost due to re-cleaning of the photomask or occurrence of failure due to re-cleaning can be prevented and the photomask can be stably used. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
