| 发明名称 |
METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCESSING SYSTEM |
| 摘要 |
The present invention presents an improved baffle plate for a plasma processing system, wherein the design and fabrication of the baffle plate advantageously provides for a uniform processing plasma in the process space with substantially minimal erosion of the baffle plate.
|
| 申请公布号 |
US2007204794(A1) |
申请公布日期 |
2007.09.06 |
| 申请号 |
US20070745185 |
申请日期 |
2007.05.07 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
NISHIMOTO SHINYA;MITSUHASHI KOUJI;NAKAYAMA HIROYUKI |
| 分类号 |
B05C11/00;C23C16/00;C23C16/455;C23F1/00;H01J37/00;H01J37/32;H01L21/306;H01L21/3065 |
主分类号 |
B05C11/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
