| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a bottom substrate of a liquid crystal display device that can perform five phases of photomask (lithography etching) processes with four photomasks, and that can reduce costs for designing and manufacturing the photomasks, thereby reducing costs of manufacturing the device. <P>SOLUTION: A first metal layer is laminated, and the first metal layer is patternized by using a first photomask. A first insulating layer is formed on the substrate and the first metal layer. A semiconductor layer is formed on the first insulating layer, and the semiconductor layer is patternized by using the first photomask. Further, the semiconductor layer is positioned on the first metal layer, and a second metal layer is formed on the semiconductor layer and the second metal layer is patternized. A second insulating layer is formed on the second metal layer, the semiconductor layer and the first insulating layer. The second insulating layer is patternized, and a transparent electrode layer is formed on the second insulating layer to thereby patternize the transparent electrode layer. <P>COPYRIGHT: (C)2007,JPO&INPIT |
