| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing method and a manufacturing method of an electrooptical device which prevents abnormal discharge by a process sequence to avoid damaging an electrostatic chuck and a substrate. <P>SOLUTION: In a surface treatment of a substrate P laid in a chamber 12, plasma is generated by applying a high frequency voltage to treat the surface, using a cooling gas against heating of the substrate P subjected to this treatment. In this plasma processing method, the cooling gas is introduced after once stopping feeding the high frequency voltage at the start of the process. <P>COPYRIGHT: (C)2007,JPO&INPIT |
