| 摘要 |
PROBLEM TO BE SOLVED: To improve the operation rate of a substrate processing apparatus using a liquid material by facilitating a maintenance work, shortening a working time and prolonging a maintenance period by allowing a deposited matter to be removed without detaching a vaporization unit. SOLUTION: The apparatus is provided with a processing chamber 26 for housing a substrate 11; a gas supplying means for supplying a desired gas to the processing chamber; a gas discharging means 53 for discharging the atmosphere in the processing chamber; and an evaporating unit 35 forming one part of the gas supplying means, and vaporizing the raw material in a liquid state at a room temperature. The vaporizing unit is provided with a vaporization space; a heating section for heating the vaporization space; a reservoir for preserving the deposit produced from the raw material; and a discharging section for discharging the deposit preserved in the reservoir. COPYRIGHT: (C)2007,JPO&INPIT
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