| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern correction device of less variation in correction quality. <P>SOLUTION: In the pattern correction device, the output of a substrate heater 6 is controlled so that a detection temperature agrees with a target temperature while the temperature at the position of a defective part 13a of an electrode 13 formed on a substrate 14 is detected by a temperature detecting part T in non-contact manner. The mist of a correction liquid 20 is jetted to the defective part 13a from a coating nozzle 30, to form a deposition layer 32 for correcting the defective part 13a. Thus, the temperature of the defective part 13a and a deposition layer 36 is kept constant, resulting in less variation in correction quality. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
