| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of inspecting a substrate processing apparatus capable of reducing the number of processing steps of an operator. <P>SOLUTION: In this inspection method, if it is determined that the operation time of a substrate processing apparatus 10 communicating with a host 26 comes under a period required for wet cleaning, a carrying-in prohibition trigger for instructing to prohibit carrying a wafer W for product into a target process unit is transmitted from the host 26 to the substrate processing apparatus 10 (S202). When the contents of an automatic setup recipe is confirmed and the kind and the number of inspection wafers corresponding to inspection items using wafers are confirmed, a request of carrying a test hoop is transmitted from the substrate processing apparatus 10 to the host 26 (S212). When the mapping information of the test hoop attached on a load port 24 is reported from the substrate processing apparatus 10 to the host 26, the kind of wafers for inspection stored in the test hoop and information about a target process unit to which each of the wafers for inspection is carried in are transmitted as a special port declaration to the substrate processing apparatus 10 (S220). <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
