| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target in which the generation of arcing is little over a long period of time during film deposition by sputtering, an electrically conductive ceramic sintered compact which is used to obtain the sputtering target, and a manufacturing method capable of easily obtaining such a sintered compact. <P>SOLUTION: It is capable of obtaining an electrically conductive ceramic sintered compact having a particle size of the sintered compact of at least 0.5 μm and smaller than 1 μm and a density of the sintered compact of at least 98% and an electrically conductive ceramic sintered compact having a particle size of the sintered compact of at least 0.5 μm and smaller than 2 μm and a density difference in the thickness direction of not more than 1% by sintering a formed body composed of the raw material powder through electromagnetic heating. It is also capable of obtaining an excellent sputtering target in which the generation of arcing is little over a long period of time and which has high mechanical strength by using such a sintered compact as a target material. <P>COPYRIGHT: (C)2007,JPO&INPIT |
