| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method for easily forming a three-dimensional photonic crystal with high working precision. <P>SOLUTION: The method of forming three-dimensional photonic crystal comprises: a process of preparing a starting material having first and second surfaces which intersect to each other at a first angle; a process of forming a first mask on the first surface of the starting material; a process of removing a part of the starting material which is not protected by the first mask, by performing dry etching for the first surface at a second angle from above the first mask; a process of forming a second mask on the second surface; and a process of removing a part of the starting material which is not protected by the second mask, by performing dry etching for the second surface at a third angle from above the second mask. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
