发明名称 PHASE CHANGE MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To achieve the large-scale mass production of phase change memory devices by suppressing heat discharge from both of upper and lower side metals in a phase change area in a memory cell of a phase change memory device, and minimizing the reduction of heat efficiency. <P>SOLUTION: Heat discharge from a lower side contact plug of a phase change layer is suppressed by adopting a different material contact plug 104. Namely, heat discharge is suppressed by connecting a heater electrode 110 to a first conductive material plug 106 composed of a first conductive material of which the specific resistance is larger than that of a second conductive material (inversely, heat conductivity is smaller). Heat discharge from the upper side electrode of the phase change layer is suppressed by adopting electrode structure which adopts an extracting electrode 116 but does not arrange the electrode 116 just above the phase change area (vicinity of the upper surface 112 of the heater electrode 110). <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007227812(A) 申请公布日期 2007.09.06
申请号 JP20060049409 申请日期 2006.02.25
申请人 ELPIDA MEMORY INC 发明人 HAYAKAWA TSUTOMU
分类号 H01L27/105;H01L21/768;H01L45/00 主分类号 H01L27/105
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