| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a dry film resist having a cured resist pattern excellent in detachability, with which a substrate having photosensitivity is processed without discoloration, deterioration, decomposition or polymerization of the substrate. <P>SOLUTION: The dry film resist has a photosensitive resin layer having the cured resist pattern on a support film and a protective layer on the resin layer. <P>COPYRIGHT: (C)2007,JPO&INPIT |
