| 摘要 |
PROBLEM TO BE SOLVED: To maximally prevent a metal surface from being exposed to a reaction chamber while preventing damage caused by contact between a reaction tube and a lid body. SOLUTION: A substrate processor is provided with a quartz-made reaction tube 2, whose one end is opened after demarcating the reaction chamber 4 for processing a substrate 31, a heating means 42 for heating the substrate, a gas supply means for supplying a processing gas to the reaction chamber, an exhaust means 68 for exhausting an atmosphere gas in the reaction chamber, a metallic support member for supporting the reaction tube while being engaged with the opening end side of the reaction tube, and the lid body 35 for hermetically closing an opening 19 of the reaction tube while being brought into contact with the support member. The inner wall face of the reaction tube is extended in the lid body direction so as to cover a face, which is adjacent to the reaction chamber, of the support member. COPYRIGHT: (C)2007,JPO&INPIT
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