| 发明名称 |
LIQUID FOR IMMERSION EXPOSURE PROCESS AND RESIST PATTERN FORMING METHOD USING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid having extremely high transparency and a refractive index higher than that of water in a wavelength ≤200 nm which is known as a vacuum ultraviolet area in an immersion exposure process, and a resist pattern forming method using the liquid. <P>SOLUTION: A liquid for the immersion exposure process contains a saturated hydrocarbon compound, and has an impurity concentration ≤3.3 mmol/mol in double bond conversion. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2007227811(A) |
申请公布日期 |
2007.09.06 |
| 申请号 |
JP20060049369 |
申请日期 |
2006.02.24 |
| 申请人 |
MITSUBISHI GAS CHEM CO INC |
发明人 |
MATSUMURA KOUEI;KIMURA YOSHIYA;KIYAMA NAOYUKI;WATANABE YOSHIYASU;ZENYOUJI KAZUYA |
| 分类号 |
H01L21/027;G02B1/04;G03F7/20 |
主分类号 |
H01L21/027 |
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