METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM DRAWING

摘要

PROBLEM TO BE SOLVED: To provide a drawing method or apparatus for correcting an astigmatism. SOLUTION: The electron beam drawing method in which the beam is deflected in main and sub two stages comprises an astigmatic differential measurement process of measuring a sub deflection astigmatic differential by scanning predetermined marks in directions of 0°and 90°, using a beam where the sub deflection astigmatism is corrected with a sub deflection astigmatism correction value S1(n); an S1(n+1) calculation process (S114) of calculating S1(n+1) where the sub deflection astigmatic differential disappears on the basis of a sub deflection astigmatism coefficient R1; and a drawing process (S130) for drawing a sample with an electron beam where the sub deflection astigmatism is corrected by S1(n+1) satisfying ¾S1(n+1)-S1(n)¾<Δ. It is possible to perform drawing where the sub deflection astigmatism is corrected. COPYRIGHT: (C)2007,JPO&INPIT