发明名称 |
Acoustic mirror manufacturing method for e.g. bulk acoustic wave resonator, involves applying planarization layer, and exposing low acoustic layer section by structuring planariztion layer, where section is associated to active area |
摘要 |
<p>The method involves producing a low acoustic layer (106b 1) on a high acoustic layer (106a 1) of an acoustic mirror in such a manner that the low acoustic layer partially covers the high acoustic layer. A planarization layer (132) is applied on the layers, and a section of the planarization layer remaining outside of a section of the low acoustic layer is removed for planarizing a structure of the mirror. The low acoustic layer section is exposed by structuring the planariztion layer, where the low acoustic layer section is associated to an active area of a piezoelectric resonator. An independent claim is also included for a method for manufacturing a piezoelectric resonator.</p> |
申请公布号 |
DE102006008721(A1) |
申请公布日期 |
2007.09.06 |
申请号 |
DE20061008721 |
申请日期 |
2006.02.24 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
THALHAMMER, ROBERT;MARKSTEINER, STEPHAN;FATTINGER, GERNOT |
分类号 |
H03H3/007 |
主分类号 |
H03H3/007 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|