| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate support device and an exposure device in which the impact of contaminants can be reduced while enhancing the planarity of the supported surface of an exposed substrate. <P>SOLUTION: An annular frame portion 102 having a forward end face 102a on the same plane, and a protrusion 103 having a forward end face 103a on the same plane as the forward end face 102a of the frame portion 102 are formed on a proximal portion 101a, and a soft portion 110 composed of soft urethane foam is arranged to fill the gap between a wafer supporting surface 110a parallel with the forward end face 102a and the proximal portion 101a. The soft portion 110 has breathability and when air is sucked by means of a vacuum pump 10 through a suction hole 105 formed in the proximal portion 101a, the wafer 20 is suction held on the wafer supporting surface 110a. <P>COPYRIGHT: (C)2007,JPO&INPIT |
