发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device with high yield, high productivity, high operative performance, and high reliability. <P>SOLUTION: The semiconductor device 1 comprises a semiconductor chip 3, a source electrode 3a formed on the semiconductor chip 3 and electrically connected to a lead frame 4, and a gate electrode 3b. Being laser-welded to a thin film-shaped connection 4a formed at the end of the lead frame 4, the electrode 3a is electrically connected to the lead frame 4. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007227893(A) 申请公布日期 2007.09.06
申请号 JP20060351653 申请日期 2006.12.27
申请人 NEC ELECTRONICS CORP 发明人 TANAKA MASAKAZU;TAKAHASHI KOHEI
分类号 H01L21/60;B23K26/00;B23K26/20;H01L23/48 主分类号 H01L21/60
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