| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask inspection support system capable of making mask inspection easy and efficient, and a mask inspection support method. <P>SOLUTION: For example, when a dimension measurement part is designated in a pattern prior to an OPC (optical proximity correction) process, the pattern shape in the designated part is changed after the OPC process, which makes the dimension measurement impossible. Therefore, the system automatically recognizes the shape of a pattern 33a after the OPC process by recognizing the coordinates of each vertex and sets candidates [1] to [5] for a dimension measurement window which is a candidate for a region where the dimension measurement is done, in a space between coordinates of vertexes. Then candidates having an enough width D for the dimension measurement are selected from the candidates [1] to [5], and further, a candidate closest as possible to the dimension measurement part (center line) designated in the pattern before the OPC process is selected. As a result, the candidate [4] is determined as a dimension measurement window. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
