发明名称 |
Bond pad structure for wire bonding |
摘要 |
A bond pad structure of an integrated circuit is provided. The bond pad structure includes a conductive bond pad, a first dielectric layer underlying the bond pad, and an M<SUB>top </SUB>plate located in the first dielectric layer and underlying the bond pad. The M<SUB>top </SUB>plate is a solid conductive plate and is electrically coupled to the bond pad. The bond pad structure further includes a first passivation layer over the first dielectric layer wherein the first passivation layer has at least a portion under a middle portion of the bond pad. At least part of an active circuit is located under the bond pad.
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申请公布号 |
US2007205508(A1) |
申请公布日期 |
2007.09.06 |
申请号 |
US20060409297 |
申请日期 |
2006.04.21 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
HSIA CHIN-CHIU;YAO CHIH-HSIANG;HUANG TAI-CHUN;PENG CHIH-TANG |
分类号 |
H01L23/48 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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