发明名称 |
METHOD FOR PREPARING A LARGE GLASS SUBSTRATE FOR A PHOTOMASK, METHOD FOR EXPOSING A MOTHER GLASS, AND COMPUTER READABLE RECORDING MEDIUM |
摘要 |
A large-size glass substrate, from which a photomask substrate is formed, is prepared by processing a large-size glass substrate stock by (1) a flattening removal quantity based on height data of the substrate stock in the vertical attitude plus a deformation-corrective removal quantity. The deformation-corrective removal quantity is calculated from (2) a deflection of the substrate stock by its own weight in the horizontal attitude, (3) a deformation of the photomask substrate caused by chucking in an exposure apparatus, and (4) an accuracy distortion of a platen for supporting a mother glass. |
申请公布号 |
EP1829836(A1) |
申请公布日期 |
2007.09.05 |
申请号 |
EP20060766585 |
申请日期 |
2006.06.12 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
UEDA, SHUHEI;SHIBANO, YUKIO;WATABE, ATSUSHI;KUSABIRAKI, DAISUKE |
分类号 |
G03F1/38;C03C19/00;G03F1/60;G03F1/68;G03F7/20;H01L21/027 |
主分类号 |
G03F1/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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