A TUNABLE SIDEWALL SPACER PROCESS FOR CMOS INTEGRATED CIRCUITS,申请号KR20000030545-传众专利搜索

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发明名称	A TUNABLE SIDEWALL SPACER PROCESS FOR CMOS INTEGRATED CIRCUITS
摘要
申请公布号	KR100756119(B1)	申请公布日期	2007.09.05
申请号	KR20000030545	申请日期	2000.06.03
申请人		发明人
分类号	H01L21/8228;H01L21/8238;H01L27/092	主分类号	H01L21/8228
代理机构		代理人
主权项
地址

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