发明名称
摘要 <p>PURPOSE: To obtain a annealing method of a silica glass, which is capable of producing a high homogeneous silica glass lump small in strain in high yield. CONSTITUTION: The annealing method of the silica glass is for annealing the silica glass covered with a vessel, powder or board. The vessel, powder or board consists preferably of silica. And the vessel, powder or board consists of a material having >=0.004 to <0.08 (cal.s<-1> .cm<-1> . deg.C<-1> ) thermal conductivity.</p>
申请公布号 JP3972374(B2) 申请公布日期 2007.09.05
申请号 JP19940229263 申请日期 1994.09.26
申请人 发明人
分类号 C03B20/00;C03B27/012 主分类号 C03B20/00
代理机构 代理人
主权项
地址