EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus (EX) irradiates a substrate (W) with exposure light (EL) via a projection optical system (PL) to expose the substrate W). The projection optical system (PL) has a first optical element (LS1) nearest to an image plane of the projection optical system (PL) and a second optical element (LS2) second nearest to the image plane after the first optical element (LS1). The exposure apparatus (EX) includes: an immersion mechanism (2) that fills a first space (K1) on a bottom surface (T3) side of the second optical element (LS2) with a liquid; a gas substitution apparatus (3) that fills a second space (K2) on an upper surface (T4) side of the second optical element (LS2) with a gas; and a control apparatus (CONT) that adjusts a pressure difference between a pressure of the liquid (LQ) in the first space (K1) and a pressure of the gas in the second space (K2).