发明名称 |
Photoresist coating liquid supplying apparatus and method, and photoresist coating apparatus using said first apparatus |
摘要 |
This invention provides a photoresist coating liquid supplying apparatus and a photoresist coating liquid supplying method, for supplying a photoresist coating liquid having a low particle content to a photoresist coating apparatus, and a photoresist coating apparatus using such a photoresist coating liquid supplying apparatus, which can realize coating without causing significant defects in a cost-effective manner. The photoresist coating liquid supplying apparatus comprises a buffer vessel for a photoresist coating liquid, a circulation filtering apparatus for drawing a part of the coating liquid from the buffer vessel, filtering the coating liquid, and then returning the filtered coating liquid to the buffer vessel, and a pipe for supplying the coating liquid from the buffer vessel or the circulation apparatus to a coating apparatus. The photoresist coating liquid supplying method uses the photoresist coating liquid supplying apparatus. The photoresist coating apparatus comprises a combination of the coating liquid supplying apparatus with a slit coating apparatus.
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申请公布号 |
EP1830393(A1) |
申请公布日期 |
2007.09.05 |
申请号 |
EP20050809597 |
申请日期 |
2005.11.25 |
申请人 |
AZ ELECTRONIC MATERIALS USA CORP. |
发明人 |
TANIGUCHI, KATSUTO;KOJIMA, KAZUHIRO;NOYA, ATSUKO |
分类号 |
H01L21/027;B05C5/02;B05C11/10;B05D3/00;G03F7/16 |
主分类号 |
H01L21/027 |
代理机构 |
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主权项 |
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地址 |
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