发明名称 Illumination optical system, exposure apparatus, and device manufacturing method with modified illumination generator
摘要 An illumination optical system for illuminating a target surface using light from a light source includes a modified illumination generator for generating a modified illumination with a predetermined polarization state for the target surface, wherein the modified illumination generator includes a lambda/4 phase plate unit that includes a lambda/4 phase plate for converting a circularly polarized light into a linearly polarized light in a predetermined direction, and a diffractive optical element unit that is arranged in a substantially conjugate relationship with the target surface, and includes a diffractive optical element used for the lambda/4 phase plate to generate a predetermined illumination intensity distribution when the diffractive optical element unit receives the linearly polarized light.
申请公布号 US7265816(B2) 申请公布日期 2007.09.04
申请号 US20050158017 申请日期 2005.06.20
申请人 CANON KABUSHIKI KAISHA 发明人 TSUJI TOSHIHIKO
分类号 G03B27/72;G03B27/54;G03F7/20 主分类号 G03B27/72
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