| 摘要 |
A particle beam lithography system and method of blanking a beam such as a particle or other beam. The system may include a frequency divider adapted to convert a master clock signal at a first frequency into an integral number N of waveforms at a second frequency, a reference device adapted to provide a fixed threshold reference signal, a sequencer adapted to provide N sets of data, a blanking circuit for each of the waveforms for creating a blanking signal for each of the waveforms, and a logic circuit for combining each of the blanking signals from each of the blanking circuits. The blanking circuit may include a digital to analog converter adapted to receive one of the N sets of data from the sequencer and to generate a variable threshold reference signal and a window comparator adapted to receive one of the waveforms, the fixed threshold reference signal, and the variable threshold reference signal and to generate a blanking signal.
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