发明名称 Method of fabricating silicon on glass via layer transfer
摘要 A method of fabricating a silicon-on-glass layer via layer transfer includes depositing a layer of SiGe on a silicon substrate; relaxing the SiGe layer; depositing a layer of silicon on the relaxed SiGe layer; implanting hydrogen ions in a second hydrogen implantation step to facilitate splitting of the wafer; bonding a glass substrate to the strained silicon layer to form a composite wafer; splitting the composite wafer to provide a split wafer; and processing the split wafer to prepare it for subsequent device fabrication.
申请公布号 US7265030(B2) 申请公布日期 2007.09.04
申请号 US20040894685 申请日期 2004.07.20
申请人 SHARP LABORATORIES OF AMERICA, INC. 发明人 MAA JER-SHEN;LEE JONG-JAN;TWEET DOUGLAS J.;HSU SHENG TENG
分类号 H01L21/46 主分类号 H01L21/46
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