发明名称 CLEANING PROCESSING APPARATUS
摘要 A cleaning apparatus is provided to increase the number of scrub cleaning units mounted on a cleaning system by arranging a plurality of scrub cleaning units in a multistage manner. A substrate(W) is horizontally maintained by a spin chuck which rotates the substrate within the surface of the spin chuck. The surface of the substrate maintained by the spin chuck is cleaned by a plurality of brushes. The brush is maintained by a plurality of brush maintenance arms. The plurality of brush maintenance arms are respectively and independently scanned by a plurality of arm driving units. The plurality of arm driving units are controlled by a controller. At least one of the plurality of brush maintenance arms can pass another brush maintenance arm in a scan direction. The controller can control the plurality of arm driving unit so that the plurality of brush maintenance arms don't collide with each other.
申请公布号 KR20070089905(A) 申请公布日期 2007.09.04
申请号 KR20070085608 申请日期 2007.08.24
申请人 TOKYO ELECTRON LIMITED 发明人 ISHIHARA AKIRA
分类号 H01L21/304;B08B1/04;H01L21/00;H03H17/02;H03H21/00 主分类号 H01L21/304
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