| 摘要 |
A lithographic apparatus includes a slide assembly, having a base, which base has a running surface, a slide member adapted to move over the running surface, and a bearing system configured to create a distance between the slide member and the running surface. The bearing system includes a first force generating device configured to provide a first force in a first direction, the first direction being substantially perpendicular to the running surface, and a second force generating device configured to provide a second force in a second direction, the second force being opposite to the first direction. The first and second force generating devices are adapted to cooperate in establishing the distance between the slide member and the running surface. The second force generating device includes a plurality of force generating elements defining an area between them, in which area the first force generating device is arranged.
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