发明名称 |
Fortified, compensated and uncompensated process-sensitive scatterometry targets |
摘要 |
A scatterometry target is provided in which a plurality of parallel elongated features are placed, each having a length in a lengthwise direction. A plurality of stress-relief features are disposed at a plurality of positions along the length of each elongated feature.
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申请公布号 |
US7265850(B2) |
申请公布日期 |
2007.09.04 |
申请号 |
US20030605751 |
申请日期 |
2003.10.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ARCHIE CHARLES N.;SENDELBACH MATTHEW J. |
分类号 |
G01B11/14;G01B11/24;G01B11/30;G01D5/36;G01N21/00;G01N21/86;G01V8/00;G03F7/20;H01L23/544;H01L23/58;H01L29/10 |
主分类号 |
G01B11/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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