发明名称 CHEMICAL LIQUID SUPPLY PUMP
摘要 <p>A chemical liquid feed pump capable of stabilizing the discharge of a chemical liquid by reducing the pulsation of a discharge pressure by a diaphragm and fine-controlling the discharge pressure. The opening (22d) of a supply/discharge passage (22b) is formed in the inner wall surface (22c) of a working chamber (26) (recessed part (22a)) at its center part, and a pin (24) projected to the diaphragm (23) side is mounted at a position offset from the center part. When the diaphragm (23) is deformed to the working chamber (26) side by the suction of an operation air into the working chamber (26) in sucking the chemical liquid, a part of the diaphragm (23) opposed to the pin (24) rides over the pin (24) and brought into a deformed state to the pump chamber (25) side in a slightly projected shape. When the operation air is supplied from the opening (22d) of the supply/discharge passage (22b) into the working chamber (26) in jetting the chemical liquid, the deformation is started preferentially at the portion of the diaphragm (23) riding over the pin (24).</p>
申请公布号 KR20070085505(A) 申请公布日期 2007.08.27
申请号 KR20077012067 申请日期 2005.09.26
申请人 CKD CORPORATION;OCTEC INC. 发明人 OKUMURA KATSUYA;ITOH SHIGENOBU;SUGATA KAZUHIRO;ARAKAWA KAZUHIRO
分类号 H01L21/02;H01L21/027 主分类号 H01L21/02
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