Disclosed is a polishing pad which enables high-precision optical end point detection during polishing operation, while enabling to prevent slurry leakage from between a polishing region and a light-transmitting region even after long use. Specifically disclosed is a polishing pad which is provided with a water permeation-preventing layer (10) on one side of a polishing region (8) and a light-transmitting region (9). The light-transmitting region and the water permeation-preventing layer are formed integrally from a same material.
