PHOTORESIST COATING LIQUID SUPPLYING APPARATUS, AND PHOTORESIST COATING LIQUID SUPPLYING METHOD AND PHOTORESIST COATING APPARATUS USING SUCH PHOTORESIST COATING LIQUID SUPPLYING APPARATUS

摘要

A photoresist coating liquid supplying apparatus and a coating liquid supplying method are provided for supplying a photoresist coating apparatus with a photoresist coating liquid having less particles contained. A photoresist coating apparatus which can perform coating having less defects and excellent cost performance by using such photoresist coating liquid supplying apparatus is also provided. The photoresist coating liquid supplying apparatus is provided with a buffer container for the photoresist coating liquid; a circulating filter apparatus for pumping out a part of the coating liquid from the buffer container, filtering it and then returning it to the buffer container; and piping for feeding the coating liquid from the buffer container or the circulating apparatus to the coating apparatus. The photoresist coating liquid supplying method using such photoresist coating liquid supplying apparatus, and the photoresist coating apparatus wherein the coating liquid supplying apparatus is combined with a slit coating apparatus are also provided.