METHOD FOR FORMING A PHOTORESIST PATTERN

摘要

A method for forming a photoresist pattern includes placing a semiconductor wafer having condensable species in a chemically filtered photolithography system and desorbing the chemical species from the semiconductor wafer in the chemically filtered photolithography system. After desorbing the chemical species, photoresist is applied to the semiconductor wafer in the chemically filtered photolithography system. Next, the photoresist is exposed to energy to form a photoresist pattern in the chemically filtered photolithography system.