发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 <p>A nonvolatile memory has a problem in that applied voltage is high. This is because a carrier needs to be injected into a floating gate through an insulating film by a tunneling effect. In addition, there is concern about deterioration of the insulating film by performing such carrier injection. An object of the present invention is to provide a memory in which applied voltage is lowered and deterioration of an insulating film is prevented. One feature is to use a layer in which an inorganic compound having a charge-transfer complex is mixed with an organic compound as a layer functioning as a floating gate of a memory. A specific example is an element having a transistor structure where a layer in which an inorganic compound having a charge-transfer complex is mixed with an organic compound and which is sandwiched between insulating layers is used as a floating gate.</p>
申请公布号 KR20070087024(A) 申请公布日期 2007.08.27
申请号 KR20077015830 申请日期 2005.12.08
申请人 SEMICONDUCTOR ENERGY LABORATORY K.K. 发明人 FURUKAWA SHINOBU;IMAHAYASHI RYOTA
分类号 H01L27/115 主分类号 H01L27/115
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