LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus and a method for manufacturing a device are provided to improve displacement measuring accuracy by using a displacement measuring system having degree of freedom over three coplanar in an x-y-z coordinates. An irradiating light system(IL) conditions a radiation beam. A supporting structure supports a patterning device capable of forming a pattern on a cross-section of the radiation beam so as to from a patterned radiation beam. A substrate table(WT) is configured to support a substrate. A projection system projects the patterned radiation beam onto a target section of the substrate. A displacement measuring system is configured to measure a movable target with respect to a reference frame of a lithographic apparatus with a degree of freedom over three coplanar in an x-y-z coordinates centering around the movable target. The displacement measuring system is comprised of three sensor heads.