发明名称 |
POLISHING COMPOSITION |
摘要 |
ABSTRACT For aluminum disks and glass-made hard disks, those disks having a mean waviness of less than 3 Å are being desired in order to increase the density of memory capacity. The present invention provides polishing compositions that can give smoothly polished surfaces for the disks. The polishing compositions are polishing compositions for aluminum disks or substrates having silica on the surface thereof, which contain colloidal silica particle groups having different particle size distributions and have a SiO2 concentration of 0.5 to 50% by weight.
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申请公布号 |
KR20070087204(A) |
申请公布日期 |
2007.08.27 |
申请号 |
KR20077016893 |
申请日期 |
2007.07.23 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
OTA ISAO;NISHIMURA TOHRU;YAMADA GEN |
分类号 |
C09K3/14;B24B37/00;B24B37/04;B82Y10/00;B82Y99/00;C09G1/02;G11B5/84;H01L21/304 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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