发明名称 POLISHING COMPOSITION
摘要 ABSTRACT For aluminum disks and glass-made hard disks, those disks having a mean waviness of less than 3 Å are being desired in order to increase the density of memory capacity. The present invention provides polishing compositions that can give smoothly polished surfaces for the disks. The polishing compositions are polishing compositions for aluminum disks or substrates having silica on the surface thereof, which contain colloidal silica particle groups having different particle size distributions and have a SiO2 concentration of 0.5 to 50% by weight.
申请公布号 KR20070087204(A) 申请公布日期 2007.08.27
申请号 KR20077016893 申请日期 2007.07.23
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 OTA ISAO;NISHIMURA TOHRU;YAMADA GEN
分类号 C09K3/14;B24B37/00;B24B37/04;B82Y10/00;B82Y99/00;C09G1/02;G11B5/84;H01L21/304 主分类号 C09K3/14
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