发明名称 CYLINDRICAL MAGNETRON WITH SELF CLEANING TARGET
摘要 A cylindrical magnetron capable of running at high current and voltage levels with a target tube that is self cleaning not only in the center portion, but also at the ends. Sputtering the ends of the target tube virtually eliminates accumulation of condensate at the ends and any resultant arcing, resulting in a more reliable magnetron requiring less service and a magnetron that produces more consistent coatings. A low sputtering-rate collar is affixed to the target tube in the turnaround area.
申请公布号 KR20070083481(A) 申请公布日期 2007.08.24
申请号 KR20077003389 申请日期 2007.02.12
申请人 VON ARDENNE ANLAGENTECHNIK GMBH 发明人 RIETZEL JAMES G.;JOHNSON KEVIN;BANTA RODNEY B.
分类号 H01J37/34;H01J37/32;H01J37/36 主分类号 H01J37/34
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