发明名称 HEAT TREATMENT DEVICE AND METHOD OF MANUFACTURING SUBSTRATE
摘要 A heat treatment device and a method of manufacturing substrates capable of reducing the slippage of the substrates when the substrates are supported on support parts comprising plate-like members. The device comprises a support device (30) having the support parts (58) in contact with the substrates (54) and a body part (57) supporting the support parts (58). Each of the support parts (58) comprises the plate-like members supporting the substrate (54) so as not to come into contact with the peripheral edge portion of the substrate (54), and a non-contact part (70) communicating with the outside without coming into contact with the substrate (54) is formed in the substrate placing surface of the support part (58). The overall opening area of the portion of the non-contact part communicating with the outside is 25 to 94% of the overall area of the substrate placing surface.
申请公布号 KR20070083564(A) 申请公布日期 2007.08.24
申请号 KR20077006112 申请日期 2007.03.16
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 SASAJIMA RYOTA;NAKAMURA IWAO
分类号 H01L21/324;H01L21/22 主分类号 H01L21/324
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