| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing composition being excellent in polishing power and polishing rate, producing inconspicuous polishing flaws, being handled lightly, and producing good finish after polishing and to provide applications thereof. <P>SOLUTION: Provided are a water-based emulsion polishing composition which is a water-based emulsion polishing composition containing 5 to 60 mass% polishing grains, 1 to 10 mass% lubricating oil, 10 to 60 mass% organic solvent, 0.1 to 5.0 mass% surfactant, 0.1 to 2.0 mass% thickener, and water, wherein (a) the polishing grains used comprise alumina and/or silica and/or aluminosilicate and/or stannic oxide, (b) the lubricant used comprises ricinoleic triglyceride (castor oil), liquid paraffin and glycerol, and (c) the surfactant used comprises a ricinoleate (castor oil fatty acid salt) and polyoxyethylene sorbitan fatty acid ester or polyoxyethylene sorbitol fatty acid ester; and applications thereof. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
