| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputter source in which a target can be easily baked and replaced. SOLUTION: A backing plate 6 is arranged in a lower part of the target 4 of the sputter source 2. An annular water channel 18 is arranged in a lower part of the backing plate 6, and a water-cooling pipe 20 is connected to a lower part of the channel. A cylindrical magnet 34 and an annular magnet 36 are arranged in a lower part of the backing plate 6. A notched part 45 is formed in the annular magnet 36 and a magnet-holding member 38, and the water-cooling pipe 20 passes through the notched part 45. COPYRIGHT: (C)2007,JPO&INPIT
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