Exposure Method And Device Manufacturing Method

摘要

An exposure method is provided in which a substrate is favorably exposed in a state with a liquid being retained in a desired condition. An upper surface ( 1 A) of a base material ( 1 ) that is used as the substrate (P) to be exposed via the liquid has an effective region ( 4 ) coated with a photosensitive material ( 2 ), and at least part of the surface of the base material ( 1 ) is coated with a first material ( 3 ) such that the surface of the base material ( 1 ) does not come into contact with the liquid on an outside of the effective region ( 4 ).