| 摘要 |
A photo mask and a defect inspecting method thereof are provided to install an inspection pattern area at a vacant space and to compare the peripheral pattern area with the inspection pattern area. A photo mask(10) has a pixel pattern area(9) having the repeat pattern. Peripheral pattern areas(10A,10B,10C,10D) with no repeated pattern are installed at the circumference of the pixel pattern area. Inspection pattern areas(20A,20B,20C,20D) are installed at a vacant space with no pixel pattern area and the peripheral pattern area. The same patterns as the peripheral pattern area are arrayed to the inspection pattern areas. The peripheral pattern areas and the inspection pattern areas are compared with each other so that a defect of the peripheral pattern areas is inspected. The distance between the inspection pattern areas and the peripheral pattern areas are set above the predetermined distance so that the comparison inspection is performed by an optical system of an inspection device. |
