发明名称 Optical semiconductor device and manufacturing method of the same
摘要 A side barrier is provided between columnar dots each constituted by directly stacking respective quantum dots in seven or more layers. Out of respective side barrier layers composing the side barrier, each of the lower side barrier layers (four layers of the undermost layer to the fourth layer from the bottom) is formed as a first side barrier layer into which a tensile strain is introduced, and each of the upper side barrier layers (three layers of the fifth layer to the uppermost layer from the bottom) is formed as a second side barrier layer which has no strain.
申请公布号 US2007194299(A1) 申请公布日期 2007.08.23
申请号 US20060444420 申请日期 2006.06.01
申请人 FUJITSU LIMITED 发明人 YASUOKA NAMI;KAWAGUCHI KENICHI
分类号 H01L31/00 主分类号 H01L31/00
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