发明名称 Method of manufacturing conductive pattern and electronic device, and electronic device
摘要 The manufacturing method includes forming a molecular film 16 of at least one kind of molecule on a part of a conductive film 13 by placing, on the conductive film 13, a solution 12 containing the one kind of molecule dissolved therein, with the one kind of molecule being selected from the group consisting of: a molecule expressed by Formula (1): CF<SUB>3</SUB>(CF<SUB>2</SUB>)<SUB>n</SUB>(CH<SUB>2</SUB>)<SUB>m</SUB>SH, where n indicates a natural number of 3 to 7 while m denotes a natural number of 8 to 18; and a molecule expressed by Formula (2): CF<SUB>3</SUB>(CF<SUB>2</SUB>)<SUB>p</SUB>(CH<SUB>2</SUB>)<SUB>q</SUB>SS(CH<SUB>2</SUB>)<SUB>q'</SUB>(CF<SUB>2</SUB>)<SUB>p'</SUB>CF<SUB>3</SUB>, where p and p' each are a natural number of 3 to 7 independently while q and q' each are a natural number of 8 to 18 independently. Subsequently, the conductive film 13 located in a part where the molecular film 16 has not been formed is removed by bringing the conductive film 13 into contact with an etchant for the conductive film 13. Thus, a conductive pattern 17 is formed.
申请公布号 US2007196577(A1) 申请公布日期 2007.08.23
申请号 US20050599131 申请日期 2005.10.14
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 NAKAGAWA TOHRU
分类号 B05D1/32;B44C1/22 主分类号 B05D1/32
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