| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a superposition measuring mark capable of preventing the peeling-off of a reference mark therein and precisely measuring the misregistration of the superposition, and to provide a patterning method thereof. <P>SOLUTION: The film peeling-off of the superposition measuring mark 6 can be prevented by adding a minute projection pattern to each side of the basic mark pattern of the superposition measuring mark 6. A higher superposition precision patterning result can be obtained by precisely measuring the misregistration of the superposition using the superposition measuring mark without the film peeling-off and feeding it back to the exposure machine. <P>COPYRIGHT: (C)2007,JPO&INPIT |
