发明名称 SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a semiconductor device wherein a penetration area is arranged in an n-type well area so that the penetration area for electrically connecting a p-type well area and a semiconductor substrate, and a plurality of p-type well areas arranged within the n-type area may be easily overlapped. <P>SOLUTION: The semiconductor device is provided with a first area which is formed toward the inside of a semiconductor substrate from the surface thereof; a second area which is included in the first area, and to which the same conductive impurities as the semiconductor substrate are introduced; and a penetration area which is in contact with the bottom of the second area and is connected with the semiconductor substrate outside the first area while penetrating the first area, and to which the same conductive impurities as the semiconductor substrate are introduced. The central points of the penetration area are arranged like a honeycomb at high density in two-dimensional manner in the semiconductor device. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007214490(A) 申请公布日期 2007.08.23
申请号 JP20060035047 申请日期 2006.02.13
申请人 FUJITSU LTD 发明人 TANAKA TAKUJI
分类号 H01L27/08;H01L21/761;H01L21/8238;H01L27/092 主分类号 H01L27/08
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